HWCVD10
September 3-6, 2018
Kitakyushu, Japan Kitakyushu International Conference Center
Kyushu Institute of Technology
TEL +81-93-884-3202
FAX +81-93-884-3203
Invited Spearkers
Plenary Lecture
Hideki Matsumura (JAIST, Japan) “Current status of Cat-CVD technology - history of research and current status of industrial implementation -”
Keynote Lecture
Lothar Schäfer (Fraunhofer-IST, Germany) “Hot-wire CVD developments and applications”
Qi Wang (Jinko Solar, China) “HW/CAT-CVD for high performance crystalline silicon heterojunction solar cells”
Special Tutorial
Hironobu Umemoto(Shizuoka Univ., Osaka City Univ., Japan) “Detection of molecular radical species in catalytic and initiated chemical vapor deposition processes”
Invited Speakers
Motoaki Kawase (Kyoto Univ., Japan) “Modeling of chemical vapor deposition reactions and processes”
Alexey Y. Kovalgin (Univ. of Twente, Netherlands) “Hotwire-assisted atomic layer deposition: principles and examples”
Kenneth Lau (Drexel Univ., USA) “The highs and lows of iCVD”
Atsushi Masuda (AIST, Japan) “Various applications of hot-wire chemical vapor deposition to solar-cell fabrication technologies”
Manuel Pomaska (Forschungszentrum Jülich, Germany) “Transparent passivated contact and phosphorous catalytic-doping for crystalline silicon solar cells”
Ratnakar D. Vispute (Blue Wave Semiconductors, Inc., USA) “Leading role of HWCVD for diamond and related thin film and coating materials: from advanced instrumentation, industrial applications to future devices”
Soon-Gil Yoon(Chungnam Nat'l Univ., Korea) “Transfer-free 4-inch-scale high-quality monolayer graphene synthesis on Ti-buffered substrates”
