HWCVD10

September 3-6, 2018
Kitakyushu, Japan Kitakyushu International Conference Center


Invited Spearkers

Plenary Lecture

Hideki Matsumura (JAIST, Japan)
 “Current status of Cat-CVD technology - history of research and current status of industrial implementation -”

Keynote Lecture

Lothar Schäfer (Fraunhofer-IST, Germany)
 “Hot-wire CVD developments and applications”

Qi Wang (Jinko Solar, China)
 “HW/CAT-CVD for high performance crystalline silicon heterojunction solar cells”

Special Tutorial

Hironobu Umemoto(Shizuoka Univ., Osaka City Univ., Japan)
 “Detection of molecular radical species in catalytic and initiated chemical vapor deposition processes”

Invited Speakers

Motoaki Kawase (Kyoto Univ., Japan)
 “TBA”

Alexey Y. Kovalgin (Univ. of Twente, Netherlands)
 “Hotwire-assisted atomic layer deposition: principles and examples”

Kenneth Lau (Drexel Univ., USA)
 “The highs and lows of iCVD”

Atsushi Masuda (AIST, Japan)
 “Various applications of hot-wire chemical vapor deposition to solar-cell fabrication technologies”

Manuel Pomaska (Forschungszentrum Jülich, Germany)
 “Transparent passivated contact and phosphorous catalytic-doping for crystalline silicon solar cells”

Ratnakar D. Vispute (Blue Wave Semiconductors, Inc., USA)
 “Leading role of HWCVD for diamond and related thin film and coating materials: from advanced instrumentation, industrial applications to future devices”

Soon-Gil Yoon(Chungnam Nat'l Univ., Korea)
 “Transfer-free 4-inch-scale high-quality monolayer graphene synthesis on Ti-buffered substrates”

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